Properties Of Glass Substrates For Poly-Si Amlcd Technology

A major force for change in substrate requirements in the late 90's may well be the commercialization of poly-silicon thin film transistor (TFT) Active Matrix Liquid Crystal Display (AMLCDs) technology. The processes necessary for "poly-Si" occur at temperatures that are 150-300 deg C higher than the current amorphous-Si LCD processes. This impacts the thermal shrinkage and thermal gravimetric warp requirements of the glass, particularly as display resolutions tighten, as enabled by poly-Si. In addition, the expected integration of more components (e.g. chip-on-glass) impacts the requirements for the thermal expansion of the substrate.

Author
D M Moffatt
Origin
Corning Inc, Usa
Journal Title
Corning Research 1995 43-48
Sector
Special Glass
Class
S 1025

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Properties Of Glass Substrates For Poly-Si Amlcd Technology
Corning Research 1995 43-48
S 1025
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