Plasma Impulse Chemical Vapor Deposition

Thermal evaporation of solids onto substrates is the most commonly used technique in the production of optical coatings. This statement holds as long as we focus on optical interference systems such as those used for optical filters or for eyeware. In addition to conventional plasma vapor deposition (PVD) technologies today, plasma impulse chemcial vapor deposition (PICVD) is used at Schott Glassworks to coat substrates up to 250mm in diameter. Operating the deposition process in a pulsed mode rather than a continuous mode overcomes many limitations of the existing technologies and opens new applications for coatings.