Physico-Chemical Mechanism And Model For Silica Fluorination By Plasmachemical Methods

Silica glass doping is widely used in the fiber-optic technology. Fluorine, decreasing the silica refractive index, is one of the widespread dopants. Fluorine-doped silica is, therefore, a material for the cladding in optical fibers. Fluorine is introduced into silica during the glass synthesis by different techniques, the most flexible and promising technique being reduced - pressure plasmachemical deposition. Despite the widespread practical implementation of the silica fluorination, the mechanism of fluorine incorporation into the glass network is so far poorly understood. We report a model for silica fluorination for the case of reduced - pressure plasmachemical deposition. It is known that under these conditions the glass layers synthesised on the inner surface of the substrate tube are transparent and subsequent fusion is not required.

Author
A S Biriukov Et Al
Origin
Russian Academy Of Science, Russia
Journal Title
Proc Of Xvi Icg, Beijing, China Vol7 1995 140-143
Sector
Special Glass
Class
S 1486

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Physico-Chemical Mechanism And Model For Silica Fluorination By Plasmachemical Methods
Proc Of Xvi Icg, Beijing, China Vol7 1995 140-143
S 1486
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