Glass Surface Analysis By An Optimised Sequential Chemical Etching Technique Using The Corrosive Agent Hf/Hno3

The characterisation of the early reaction steps of the corrosion process in a liquid media represents a tremendous challenge within the field of chemical analysis. In response to this, some known instrumental methods like AFM, SIMS and SNMS have proven themselves useful. Within the work present on the subject, we will introduce an optimised direct chemical etching technique which allows the quantification of the primary removed glass surface layers. It is based on the established etching procedure using hydrofluoric acid in combination with other mineral acids. The above mentioned method is modified and appropriately extended by enhancing the precision of the selected exposure time with the help of an automatic dipping device.