Fabrication Technologies For Microsystems Utilizing Photoetchable Glass

Photoetchable glass is a very promising material for the production of components for a wide variety of microsystems. High aspect ratio microstructures can be realized by using slightly modified semiconductor equipment and relatively low fabrication costs are achievable already in small scale production. The application potential of photoetchable glass is mainly determined by the fact that this material can be applied in corrosive and high temperature environment which is of major importance for applications in chemistry and biology. Further advantages are transparency, high Young's modulus and good thermal and electric insulation. In order to promote the utilization of photoetchable glass in microsystems technology the IMM and the Schott company have built up a production line for micro devices using Foturan produced by Schott.

Author
T R Dietrich Et Al
Origin
Imm Inst Microtechnology, Mainz, Germany
Journal Title
Schott Research 1996-1998 29-36
Sector
Special Glass
Class
S 1813

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Fabrication Technologies For Microsystems Utilizing Photoetchable Glass
Schott Research 1996-1998 29-36
S 1813
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