Enhancement Of Adhesion Of Sputtered Ti Film On Glass By Nitrogen Ion Irradiation

Nitrogen ion irradiation at an acceleration voltage of 10 keV was carried out onto sputtered Ti films of 5 and 20nm in thickness on glass in order to enhance the adhesion strengths of the films. The adhesion strength strongly depended on the ion dose: the strength showed a maximum at 1x1016 and 7~8x1016 ions/cm2 for the films of 5 and 20nm in thickness, respectively. Auger Electron Spectroscopy, X-ray photoelectron spectroscopy and infrared reflection analyses showed that a mixed layer was formed at the Ti/glass interface accompanied with chemical bonds of Si-Ti and Si-0-Ti. Si-N bond expected from the nitrogen ion irradiation was not observed.

Author
M Tada Et Al
Origin
Unknown
Journal Title
Asahi Research Report 48 1998 1-9
Sector
Special Glass
Class
S 1696

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Enhancement Of Adhesion Of Sputtered Ti Film On Glass By Nitrogen Ion Irradiation
Asahi Research Report 48 1998 1-9
S 1696
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