The use of an hf plasma torch is described. Results indicate that the method is suitable for all elements except Si and is therefore useful for augmenting X-ray fluorescence analysis. The optimum use is for avg or low concentrations of glass-forming oxides but particularly for elements with low atomic numbers (Li,B,Na)
Origin
Unknown
Journal Title
Glastech Ber 51 9 1978 235-239
Sector
Primary Papers
Class
PP 1237