High quality fluorine-doped tin oxide (Sn02:F) films on glass substrates were prepared using chemical vapour deposition (CVD) method. The electrical properties, surface morphologies, structural properties and optical properties of the films were studied by varying the freon flow rates. The structure was analysed by XRD. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to study the morphology. Energy-dispesive spectroscopy (EDS) was conducted to understand the surface fluorine composition of the film. The results showed that crystalline structure of the film had a cassiterite-like diffraction patterns with a preferred orientation. Surface roughness was evaluated by atomic force microscopy, characterised by root mean square and average value.
