Deposition Of Siox On Glass Surfaces - An Atmospheric Process For Various Applications

The Pyrosil technique is a well-known process which is used to produce SiOx layers in order to modify surfaces & their properties. This is accomplished by using combustion-chemical vapour deposition (C-CVD) - a cost-saving atmospheric pressure technique. As precursors, both liquid & gaseous compounds can be used. The precursors are pyrolysed by a flame which also serves as a heating source for the substrate allowing both in-line & off-line integration into an existing process. The SiOx coatings have the potential for several different applications, eg, improved long time stability & mechanical stability of hydrophobic coatings on glass, improved adhesion of organic coatings, antireflection & therefore transmission improving properties & so on. Current results & several different aspects for the application of this technology are presented.

Author
H Tiller Et Al
Origin
Innovent Ev, Jena, Germany
Journal Title
Verre 11 4 August 2005 27-30
Sector
Special Glass
Class
S 3127

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Deposition Of Siox On Glass Surfaces - An Atmospheric Process For Various Applications
Verre 11 4 August 2005 27-30
S 3127
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