Chemical Vapor Deposition Of Coatings On Glass

Chemical vapor deposition has been used to deposit films of a wide variety of materials. Those of particular interest to the glass industry include coatings of silicon, titanium nitride, and the oxides of silicon, aluminium, tin, zinc and transition metals, which can add very useful electrical and optical properties to glass. Several different chemical sources and reactions are used to deposit these materials. Composition of these processes will be made in terms of ease of use of the precursors, attainable deposition rates, and safety and cost of the precursors. Equipment has been developed to deposit these materials with excellent thickness uniformity over large areas of glass.