Approach To Novel Glasses And Amorphous Materials For Photonics By Ion Implantation

Ion implantation is a powerful technique to significantly modify the surface and near-surface region of materials. The application of this technique to glassy and amorphous oxides remains radiation effects. This study is aimed at creation of amorphous materials with a novel optical function by applying ion implantation. The target was focused on transparent conducting materials, fast proton conducting materials, highly photosensitive materials, or nanocrystalline Ge colloid-embedded materials. Ion-silica interaction, which should be a basis for ion beam modification of amorphous materials, was successfully elucidated. (abstract only but full text version is available on Asahi's web site: www.af-info.or.jp)