Atomic Layer Deposition (ALD) is a thin film coating technique, which has many unique features. ALD is mainly used in semiconductor and display industries, but because of its attractive properties, conformal and pinhole free coatings even on very complex shapes, ALD has been combined also with many other applications. The substrate material can be silicon, glass, metal or even plastic.
Origin
Beneq Oy, Finland
Journal Title
Vacuum International 2/2008 45-48
Sector
Special Glass
Class
S 3365