Carl Zeiss is currently developing mirror systems for future semiconductor structuring technology (photolithography). The form accuracy of the individual optical surface is of crucial importance for the functionality of the system. The optical development department of Carl Ziess now has not only met, but also exceeded the specifications required for this criterion for the first time ever.
Origin
Unknown
Journal Title
Innovation (Zeiss) 6 1999 36
Sector
Special Glass
Class
S 1839