Traditionally, thin oxide films are used to improve the properties of glasses. The surface topography of initial growth stages of TiO2, Ta2O5 and SiO2 films prepared by Reactive Evaporation (RE) and Plasma Impulse Chemical Vapor Deposition (PICVD) on different glass substrates have been examined.
Origin
University Mainz, Germany
Journal Title
5Th Int Otto Schott Colloquium, Jena, July 1994 484-487
Sector
Special Glass
Class
S 885