The fundamentals of chemical vapour deposition (CVD) techniques and the key paramters determining the characteristics of the deposited layers are described in this article. Different activation methods of the precursor gases necessary to achieve high reaction rates are discussed and some practical examples of CVD techniques applied to the preparation of ceramic coatings.
Origin
Inst Ciencia De Materiales, Madrid
Journal Title
Bol Soc Esp Ceramic Vidrio 37 6 1998 447-453
Sector
Glass Ceramics
Class
GC 335