Preparation And Properties Of New Zirconium Oxyfluoride Glass By Plasma-Enhanced Chemical Vapour Deposition

Zirconium oxyfluoride glass is synthesized for the first time by plasma-enhanced chemical vapour deposition and its thermal properties are investigated. Amorphous film with an oxygen content higher than 280ppm is obtained as the product. A glass transition temperature of 330 deg. C and a crystallization temperature of 400 deg. C are observed with differential scanning calorimetry (DSC) for a film containing 8500ppm oxygen. This is a stable glass with only one cation which does not require the addition of other cations as glass modifiers and intermediates.

Author
K Fujiura Et Al
Origin
Ntt Opto Electronics Labs
Journal Title
Icg Madrid 2 1994 327-332
Sector
Special Glass
Class
S 809

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Preparation And Properties Of New Zirconium Oxyfluoride Glass By Plasma-Enhanced Chemical Vapour Deposition
Icg Madrid 2 1994 327-332
S 809
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