Tellurite glass thin film was successfully bonded on a silicate glass substrate by the direct-bonding (DB) method. Glass film (1-3um) was fabricated by the glassblowing technique and the DB process was performed at room temperature at relative humidity (RH) of 62% or 15%. The surface adhesive strengths of the glass films bonded at 15% and 62% RH were measured as 250 and 96 mJ/m2, respectively, by the Obreimoff-Metsik method. The hydroxl (-OH) functional groups on the interface between the film and silicate glass were analysed by Fourrier thin film and silicate glass were hydrogen bonds at 62% RH and bonds between Te on the tellurite glass and O on the silicate glass were concerned at 15% RH. These forces, contributed by Si-OH, were important for bond formation at 62%.
