Electrically Conducting Pbyox-Sio2 Glass Films Deposited By Reactive Radio-Frequency Magnetron Sputtering

Lead silicate glass films were deposited on sapphire substrates in different plasmas (100% Ar; 20% H2 and 80% Ar; 5% O2 + 95% Ar) by reactive radio-frequency magnetron sputtering. The stoichiometry of the films, determined by Rutherford backscattering spectroscopy, changed with the deposition conditions.

Author

G Della Mea Et Al

Origin

Italy

Journal Title

J Am Ceram Soc 76 11 1993 2930-2932

Sector

Special Glass

Class

S 776

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Journal Title J Am Ceram Soc 76 11 1993 2930-2932

Class S 776

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Electrically Conducting Pbyox-Sio2 Glass Films Deposited By Reactive Radio-Frequency Magnetron Sputtering

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