[Coating] Modern Arc Management For Dual Magnetron Sputtering

For the reactive sputtering of materials and to fulfill stringent process needs, power supply requirements are continously increasing. This article discusses the innovative arc suppression in German-based TRUMPF Huttinger's latest generation of power supplies.

Author
Un-named
Origin
Unknown
Journal Title
Glass Worldwide May-June 2016 88-89
Sector
Flat glass
Class
F 3813

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[Coating] Modern Arc Management For Dual Magnetron Sputtering
Glass Worldwide May-June 2016 88-89
F 3813
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