Carl Zeiss SMS GmbH, a leading supplier for photomask metrology and repair tools and a world leader in software and IP for semiconductor design, verification and manufacturing, Synopsys, Inc., have announced their collaboration in support of the ZEISS tool family for in-die metrology solutions for the 32-nanometer (nm) technology node and below. As per the collaboration, Synopsys will offer support for ZEISS' PROVE, the next-generation registration metrology tool, through Synopsys' CATS, the technology-leading mask data preparation solution. According to Carl Zeiss, using CATS as the data preparation engine, mask engineers using PROVE can benefit from improved efficiency and usability of a registration metrology system that meets stringent overlay accuracy requirements.
