Methods of depositing thin films of metal or other materials by vacuum deposition, the so-called "sputtering" process are considered in detail by the author. Recent developments that have contributed to the overall improvement of the technology involve the use of the planar and of the unbalanced magnetron, cathode-controlled reactive processing, dual-target medium-frequency power and successive plasma anodising.
Origin
Loughborough University Of Technology, Uk
Journal Title
Glass International June 1996 55-56
Sector
General
Class
G 1479